Substrate
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ndiro yegoridhe silicon wafer (Si Wafer) 10nm 50nm 100nm 500nm Au Yakanakisa Conductivity ye LED
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Goridhe Yakaputirwa Silicon Wafers 2inch 4inch 6inch Goridhe layer ukobvu: 50nm (± 5nm) kana gadzirisa Coating firimu Au, 99.999% kuchena
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AlN-on-NPSS Wafer: High-Performance Aluminium Nitride Layer pane Isina-Polished Sapphire Substrate yeHigh-Temperature, High-Simba, uye RF Applications.
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AlN paFSS 2inch 4inch NPSS/FSS AlN template ye semiconductor nzvimbo
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Gallium Nitride (GaN) Epitaxial Yakakura paSapphire Wafers 4inch 6inch yeMEMS
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Precision Monocrystalline Silicon (Si) Lenses - Masizi Ega ega uye Coatings eOptoelectronics uye Infrared Imaging.
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Yakagadzirirwa Yepamusoro-Kunatswa Imwe YeCrystal Silicon (Si) Malenzi - Yakagadzirirwa Saizi uye Makongiro eInfrared uye THz Zvishandiso (1.2-7µm, 8-12µm)
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Yakagadzirirwa Sapphire Nhanho-Type Optical Window, Al2O3 Single Crystal, High Purity, Diameter 45mm, Hukobvu 10mm, Laser Cheka uye Yakakwenenzverwa
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High Performance Sapphire Step Window, Al2O3 Single Crystal, Transparent Coated, Customized Shapes and sizes for Precision Optical Applications.
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Yepamusoro-Inoshanda Sapphire Simudza Pini, Yakachena Al2O3 Single Crystal yeWafer Transfer Systems - Masikirwo Emasikirwo, Kusimba Kwepamusoro kweMashandisirwo Echokwadi.
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Industrial Sapphire Simudza tsvimbo nePini, High Hardness Al2O3 Sapphire Pini yeWafer Handling, Radar System uye Semiconductor Processing – Diameter 1.6mm kusvika 2mm
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Customized Sapphire Lift Pini, High Hardness Al2O3 Single Crystal Optical Parts for Wafer Transfer – Diameter 1.6mm, 1.8mm, Customizable for Industrial Applications