SiO2 Thin Film Thermal Oxide Silicon wafer 4inch 6inch 8inch 12inch

Maitiro makuru ekugadzira mawafer esilicon akasanganiswa anowanzo sanganisira matanho anotevera: kukura kwesilicon yemonocrystalline, kucheka kuita mawafer, kupolisha, kuchenesa uye kuoxidation.

Kukura kwesilicon imwe chete: Chekutanga, monocrystalline silicon inorimwa pakupisa kwakanyanya nenzira dzakadai seCzochralski method kana kuti Float-zone method. Nzira iyi inobvumira kugadzirira makristaro esilicon imwe chete nekuchena kwakanyanya uye lattice integrity.

Kucheka: Monocrystalline silicon yakakura inowanzova nechimiro che cylindrical uye inoda kuchekwa kuita ma wafer matete kuti ishandiswe se wafer substrate. Kucheka kunowanzoitwa ne diamond cutter.

Kupolisha: Pamusoro pewafer yakachekwa panogona kunge pasina kuenzana uye zvinoda kupolisha nemakemikari kuti pave nepamusoro pakanaka.

Kuchenesa: Wafer yakakweshwa inocheneswa kubvisa tsvina neguruva.

Kuoxidizing: Pakupedzisira, mawafer esilicon anoiswa muchoto chinodziya zvakanyanya kuti agadziriswe kuoxidizing kuti agadzire jira rinodzivirira resilicon dioxide kuti rivandudze hunhu hwaro hwemagetsi uye simba remuchina, pamwe nekushanda sejira rinodzivira muzvikamu zvakabatanidzwa.

Mashandisirwo makuru e silicon wafers dzakasanganiswa anosanganisira kugadzirwa kwema circuits akabatanidzwa, kugadzirwa kwema solar cells, uye kugadzirwa kwezvimwe zvishandiso zvemagetsi. Silicon oxide wafers dzinoshandiswa zvakanyanya mumunda we semiconductor materials nekuda kwehunhu hwadzo hwakanaka hwemakanika, kugadzikana kwehukuru uye makemikari, kugona kushanda pakupisa kwakanyanya uye kumanikidzwa kwakanyanya, pamwe nehunhu hwakanaka hwekudzivirira kupisa uye optical.

Zvakanakira zvayo zvinosanganisira chimiro chakakwana chekristaro, kuumbwa kwemakemikari kwakachena, saizi chaiyo, hunhu hwakanaka hwemakanika, nezvimwewo. Izvi zvinoita kuti mawafer esilicon oxide anyatsokodzera kugadzirwa kwemacircuit akabatanidzwa ane simba repamusoro uye zvimwe zvishandiso zve microelectronic.