Zvigadzirwa
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Lenzi yeSic optical 6SP 10x10x10mmt 4H-SEMI HPSI Saizi yakagadzirirwa
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MaWafer eLiNbO₃ 2inch-8inch Ukobvu 0.1 ~ 0.5mm TTV 3µm Yakagadzirirwa
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SiC Ingot Growth Furnace yeSiC Crystal TSSG/LPE Methods ine dhayamita hombe
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Midziyo yekucheka yeInfrared Picosecond Dual-Platform Laser yeOptical Glass/Quartz/Sapphire Processing
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Dombo reSapphire jena rine ruvara rwekugadzirwa kwezvishongo zvemhando yepamusoro
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SiC ceramic end effect ruoko rwekubata wafer
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4inch 6inch 8inch SiC Crystal Growth Furnace yeCVD Process
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6 Inch 4H SEMI Type SiC composite substrate Ukobvu 500μm TTV≤5μm MOS grade
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Zvikamu zveSapphire Optical Windows Sapphire Zvakagadziriswa Zvakagadzirwa Nekupukuta Kwakakodzera
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SiC ceramic plate/tray ye 4inch 6inch wafer holder ye ICP
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Hwaro Hwakasimba Hwemahwindo eSapphire Hwakagadzirwa Nemhando Yepamusoro hweZviratidziro zveSmartphone
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12 inch SiC Substrate N Type Large Size High Performance RF Applications