Kaviri chiteshi sikweya muchina monocrystalline silicon tsvimbo kugadzirisa 6/8/12 inch pamusoro flatness Ra≤0.5μm
Equipment maitiro:
(1) Kaviri chiteshi synchronous processing
· Kubudirira kaviri: Kugadziriswa panguva imwe chete kwesimbi mbiri dzesilicon (Ø6 "-12") kunowedzera kugadzirwa ne40% -60% vs. Simplex michina.
· Kuzvimiririra kuzvidzora: Imwe neimwe chiteshi inogona kuzvimiririra kugadzirisa maparamendi ekucheka (tension, feed speed) kuti ienderane kune akasiyana silicon tsvimbo yakatarwa.
(2) Kucheka kwepamusoro-soro
· Dimensional kurongeka: sikweya bhaa parutivi kureba kushivirira ± 0.15mm, renji ≤0.20mm.
· Unhu hwepamusoro: kucheka kumucheto <0.5mm, kuderedza huwandu hwekukuya kunotevera.
(3) Kudzora noungwaru
* Adaptive kucheka: chaiyo-nguva yekutarisisa yesilicon tsvimbo morphology, shanduko inosimba yekucheka nzira (senge kugadzirisa yakabhenda silicon tsvimbo).
· Dhata traceability: rekodha magadzirirwo maparamita ega ega silicon tsvimbo kutsigira MES system docking.
(4) Mutengo wakaderera
· Diamond waya kushandiswa: ≤0.06m/mm (silicon tsvimbo kureba), waya dhayamita ≤0.30mm.
· Inotonhorera kutenderera: Iyo filtration system inowedzera hupenyu hwesevhisi uye inoderedza kuraswa kwemarara.
Technology uye budiriro zvakanakira:
(1) Kucheka tekinoroji optimization
- Multi-line yekucheka: 100-200 mitsara yedhaimondi inoshandiswa mukufanana, uye kukurumidza kucheka kuri ≥40mm / min.
-Tension control: Yakavharwa loop gadziriso system (± 1N) kuderedza njodzi yekutyoka waya.
(2) Kuenderana kwekuwedzera
- Material adaptation: Tsigiro P-mhando / N-mhando monocrystalline silicon, inoenderana neTOPCon, HJT uye mamwe mabheti esilicon tsvimbo yakakwirira.
- Flexible saizi: silicon tsvimbo kureba 100-950mm, sikweya tsvimbo parutivi kureba 166-233mm inogadziriswa.
(3) Kuvandudza otomatiki
-Robhoti kurodha uye kurodha: otomatiki kurodha / kuburitsa esilicon tsvimbo, kurova ≤3 maminetsi.
-Akangwara diagnostics: Predictive gadziriso yekudzikisa isina kurongeka yekudzika.
(4) Utungamiri hweindasitiri
- Wafer rutsigiro: inogona kugadzira ≥100μm Ultra-yakaonda nesilicon ine sikweya tsvimbo, kupatsanurwa mwero <0.5%.
- Simba rekushandisa optimization: Kushandiswa kwesimba pachikamu chesilicon tsvimbo kunoderedzwa ne30% (vs.
Technical parameters:
Zita reparameter | Index value |
Nhamba yemabhawa akagadziriswa | 2 zvidimbu / set |
Kugadzirisa bhaa kureba | 100 ~ 950mm |
Machining margin range | 166 ~ 233mm |
Cutting speed | ≥40mm/min |
Diamond wire speed | 0~35m/s |
Diamond dhayamita | 0.30 mm kana pasi |
Linear kushandiswa | 0.06 m/mm kana pasi |
Inopindirana denderedzwa tsvimbo dhayamita | Yakapedzwa sikweya tsvimbo dhayamita +2mm, Iva nechokwadi chekupukuta chiyero chekupasa |
Kucheka kumucheto breakage control | Raw mupendero ≤0.5mm, Hapana chipping, yepamusoro yepamusoro mhando |
Arc kureba kufanana | Projection range <1.5mm, Kunze kwekukanganiswa kwesilicon tsvimbo |
Zviyero zvemuchina (muchina mumwechete) | 4800×3020×3660mm |
Total rated power | 56kW |
Uremu hwakafa hwemidziyo | 12t |
Machining accuracy index tafura:
Precision chinhu | Tolerance range |
Square bar margin kushivirira | ± 0.15mm |
Square bar edge range | ≤0.20mm |
Angle kumativi ose eskweya tsvimbo | 90°±0.05° |
flatness of square rod | ≤0.15mm |
Robhoti yakadzokorodza kumira zvakanaka | ± 0.05mm |
XKH's masevhisi:
XKH inopa yakazara-kutenderera masevhisi e-mono-crystalline silicon dual-station machines, kusanganisira kugadzirisa midziyo (inoenderana nematanda makuru esilicon), maitiro ekutumira (kucheka parameter optimization), kudzidziswa kwekushanda uye mushure mekutengesa-rutsigiro (makiyi zvikamu kupa, kuremerwa kuongororwa), kuve nechokwadi chekuti vatengi vanowana goho rakawanda (> 99%) uye yakaderera consumable mutengo kugadzirwa, uye kupa tekinoroji kukwidziridzwa kweA. Nguva yekuendesa ndeye 2-4 mwedzi.
Detailed Diagram



