12 inch SiC Substrate N Type Yakakura Saizi Yakakwirira Kuita RF Zvikumbiro
Technical parameters
12 inch Silicon Carbide (SiC) Substrate Kutsanangurwa | |||||
Giredhi | ZeroMPD Kugadzirwa Giredhi(Z Giredhi) | Standard Production Giredhi(P Giredhi) | Dummy Grade (D giredhi) | ||
Diameter | 3 0 0 mm~1305mm | ||||
Ukobvu | 4H-N | 750μm±15 μm | 750μm±25 μm | ||
4H-SI | 750μm±15 μm | 750μm±25 μm | |||
Wafer Orientation | Kunze kweaxis : 4.0° yakananga <1120 >±0.5° ye4H-N, Paaxis: <0001>±0.5° ye4H-SI | ||||
Micropipe Density | 4H-N | ≤0.4cm-2 | ≤4cm-2 | ≤25cm-2 | |
4H-SI | ≤5cm-2 | ≤10cm-2 | ≤25cm-2 | ||
Resistivity | 4H-N | 0.015~0.024 Ω·cm | 0.015~0.028 Ω·cm | ||
4H-SI | ≥1E10 Ω·cm | ≥1E5 Ω·cm | |||
Yekutanga Flat Oriental | {10-10} ±5.0° | ||||
Primary Flat Length | 4H-N | N/A | |||
4H-SI | Notch | ||||
Kusabatanidzwa kumucheto | 3 mm | ||||
LTV/TTV/Bow/Warp | ≤5μm/≤15μm/≤35 μm/≤55 μm | ≤5μm/≤15μm/≤35 □ μm/≤55 □ μm | |||
Kukasharara | Polish Ra≤1 nm | ||||
CMP Ra≤0.2 nm | Ra≤0.5 nm | ||||
Edge Cracks By High Intensity Chiedza Hex Plates By High Intensity Chiedza Polytype Nzvimbo NeKusimba Kwakanyanya Chiedza Visual Carbon Inclusions Silicon Surface Scratches By High Intensity Chiedza | Hapana Cumulative area ≤0.05% Hapana Cumulative area ≤0.05% Hapana | Cumulative kureba ≤ 20 mm, single kureba≤2 mm Cumulative area ≤0.1% Cumulative area≤3% Yakawedzerwa nzvimbo ≤3% Cumulative kureba≤1×wafer dhayamita | |||
Edge Chips By High Intensity Chiedza | Hapana anotenderwa ≥0.2mm hupamhi nekudzika | 7 inotenderwa, ≤1 mm imwe neimwe | |||
(TSD) Threading screw dislocation | ≤500 cm-2 | N/A | |||
(BPD) Base plane dislocation | ≤1000 cm-2 | N/A | |||
Silicon Surface Kusvibiswa NeKunyanya Kusimba Chiedza | Hapana | ||||
Packaging | Multi-wafer Cassette Kana Single Wafer Container | ||||
Notes: | |||||
1 Miganho yekuremara inoshanda kune yese wafer pamusoro kunze kweiyo yekumucheto nzvimbo yekusarudzika. 2Kukwenya kunofanirwa kutariswa paSi face chete. 3 Iyo dislocation data inongobva kuKOH etched wafers. |
Key Features
1. Yakakura Kukura Kunobatsira: Iyo 12-inch SiC substrate (12-inch silicon carbide substrate) inopa nzvimbo yakakura ye-single-wafer, zvichiita kuti machipisi akawanda abudiswe pamucheka, nokudaro kuderedza mari yekugadzira uye kuwedzera zvibereko.
2. High-Performance Material: Silicon carbide yekudzivirira kwekushisa kwepamusoro uye simba rekuparara kwemunda rinoita kuti 12-inch substrate yakanaka kune yakakwirira-voltage uye high-frequency applications, yakadai seEV inverters uye kukurumidza-charging systems.
3. Kugadzirisa Kuenderana: Pasinei nekuoma kwakanyanya uye kugadzirisa matambudziko eSiC, iyo 12-inch SiC substrate inowana hurema hwepasi pasi kuburikidza neakagadziridzwa kucheka uye kupukuta maitiro, kunatsiridza goho remudziyo.
4. Superior Thermal Management: Nekupisa kwekushisa kwepamusoro pane silicon-based materials, 12-inch substrate inonyatsogadzirisa kupisa kwekushisa mumagetsi emagetsi, kuwedzera hupenyu hwemichina.
Main Applications
1. Motokari dzeMagetsi: The 12-inch SiC substrate (12-inch silicon carbide substrate) inhengo yenheyo yemagetsi emagetsi emagetsi anotevera, zvichiita kuti inverters yakakwirira iwedzere kuwedzera uye kuderedza nguva yekuchaja.
2. 5G Base Stations: Makuru makuru eSiC substrates anotsigira ma-high-frequency RF zvishandiso, achisangana nezvinodiwa zve5G base stations kune simba guru uye kurasikirwa kwakaderera.
3.Industrial Power Supplies: Mune solar inverters uye smart grids, iyo 12-inch substrate inogona kumira yakakwira voltages ichideredza kurasikirwa kwesimba.
4.Consumer Electronics: Ramangwana rinokurumidza majaja uye data centre simba rekushandisa rinogona kutora 12-inch SiC substrates kuti iwane compact size uye kushanda kwepamusoro.
XKH's Services
Isu tinonyanya kugadzirisa masevhisi e12-inch SiC substrates (12-inch silicon carbide substrates), kusanganisira:
1. Dicing & Polishing: Yakaderera-kukuvadza, high-flatness substrate processing yakagadzirirwa kune zvinodiwa nevatengi, kuve nechokwadi chekushanda kwechigadzirwa chakagadzikana.
2. Epitaxial Growth Support: High-quality epitaxial wafer services kuti ikurumidze kugadzirwa kwechip.
3. Diki-Batch Prototyping: Inotsigira R&D kusimbiswa kwemasangano ekutsvagisa nemabhizinesi, kupfupisa kutenderera kwebudiriro.
4. Technical Consulting: Kuguma-ku-kuguma mhinduro kubva pakusarudzwa kwezvinhu kusvika pakugadzirisa optimization, kubatsira vatengi kukunda SiC kugadzirisa matambudziko.
Ingave yekugadzirwa kwakawanda kana hunyanzvi kugadzirisa, yedu 12-inch SiC substrate masevhisi anowirirana nezvido zvepurojekiti yako, achisimbisa kufambira mberi kwetekinoroji.


